Application
 
Applicants:
The participants will be selected from worldwide applicants. Undergraduate and postgraduate students from art & design, architecture, urban planning and landscape or related disciplines are accepted.

Materials for application:
All the participants should submit the standard form (annex 1) together with the description of the work. Send the materials
thatcan explain the work like brief introduction of design concept (PDF format).
Sketches, pictures of the model, etc (jpg format)via e-mail or conventional mail(printed)to contact person before July.1 ,2008.
Please give clear indication of any special demands on presenting form.

Deadline for application: July.20th, 2008

Selection:
A panel of design professionals and academicians will select the final participants among all the applicants.

Invitation:
The coordination committee will send official invitation to the selected participants before Aug. 1st.

The application form: annex 1
Please mail your registration form to the following email before Jul.20th, 2008
Ms. YANG Lihua
Email: 2008shbiennale@gmail.com

When receive the confirmation from the organizing committee,
please mail your work to the following address before Aug.30th, 2008:
Ms. MO Jiao
College of Architecture and Urban Planning,
Tongji University, Shanghai, P.R.C., Postcode: 200092

Please stick the logo of Biennial on the envelope and the outer packing of your exhibits.

or save the picture